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Minnesota Nano Center

College of Science & Engineering

All Tools | Fabrication and Clean Room | Nanomaterials Lab | Bio-Nano Lab

Fabrication and Clean Room Tools

AJA Sputterer (badger aja-sputterer)

RF-DC metal deposition system.
SOP | Deposition Rates | ITO Summary | AJA I Training

AJA Sputterer 2 (badger aja-sputterer-2)

RF-DC metal deposition system.
Instructor: Kevin Roberts, 1-612-624-7092, rober074@umn.edu
SOP

ALD (badger ald)

Atomic layer deposition system.
SOP | ALD Training | SA-ALD Report | ALD Film Characterization

Amray FESEM (badger amray-sem)

Amray 3600 field-emmission SEM for high-resolution imaging.
Instructor: Kevin Roberts, 1-612-624-7092, rober074@umn.edu
SOP

Asher (badger asher)

Oxygen plasma cleaning system.
Instructor: Tony Whipple, 1-612-626-1868, whipp003@umn.edu
SOP

Atomic Force Microscope (badger afm-1)

Atomic force microscope measuring tool.
Instructor: Paul Kimani, 1-612-625-5968, kima0004@umn.edu
SOP | Operation Note

AV Etcher (badger av-etch)

Reactive ion etching system with Fl gases.
Instructor: Paul Kimani, 1-612-625-5968, kima0004@umn.edu
SOP | Rates | Process recipe parameters

Canon Stepper (badger canon)

An optical (I-Line) imaging lithography system. The method of lithography is sometimes called a projection form of lithography.
Instructor: Tony Whipple, 1-612-626-1868, whipp003@umn.edu
SOP | Can my process work with the Canon Stepper

CEE 200X Spinner (badger cee)

Used for applying E-beam resists and imprint resists uniformly on a substrate. Spin speed, length, acceleration, and exhaust rate can be altered to achieve desired resist thickness.
Instructor: Kevin Roberts, 1-612-624-7092, rober074@umn.edu
SOP

CHA Evaporator (badger ebevap-cha)

E-beam deposition system.
Instructor: Glenn Kuschke, 1-612-625-7368, kglenn@umn.edu
SOP | Changing fixtures | Materials | Training video | Metal step coverage example

Confocal Microscope (badger hs-scope)

Optical profiler designed for fast and non-invasive inspection and measurement of the 3-dimensional geometry of probe marks, probe cards, MEMS, micro lenses and similar micro and nano engineered or precision-machined structures.
Instructor: Mark Fisher, 1-612-626-7465, fishe024@umn.edu
SOP

Critical Point Dryer (badger cpdryer)

MEMS drying system.
Instructor: Lage von Dissen, 612-626-2028, lage@umn.edu
SOP | Training video

CV-IV (badger cviv)

Capacitance voltage-current voltage system.
Instructor: Tony Whipple, 1-612-626-1868, whipp003@umn.edu
SOP

DC Sputter (badger dcsputter)

DC metal deposition system.
Instructor: Terry Brough, 1-612-626-1871, broug001@umn.edu
SOP | Uniformity testing of sputtered aluminum on Si

Deep Trench Etcher (badger deeptrench)

Silicon etching system.
Instructor: Paul Kimani, 1-612-625-5968, kima0004@umn.edu
SOP | Rates

FEI FIB (badger fib)

Focused ion beam etching tool.
Instructor: Kevin Roberts, 1-612-624-7092, rober074@umn.edu
SOP | FIB short cut keys | Finding eucentric | Self-Supporting TEM Lamella | TEM Lamella Formation

Filmetrics (badger Filmetrics)

Thin film thickness measuring system with automated stage and wafer mapping.
SOP | Filmetrics Training

Four Point Probe (badger four-point-probe)

Thin film or surface sheet resistance measuring system.
Instructor: Kevin Roberts, 1-612-624-7092, rober074@umn.edu
SOP | Training Video

Gaertner Ellipsometer (badger ellipsometer-g)

Laser based measuring system.
SOP | Ellipsometer Training

Graphene Furnace (badger graphene-1)

Graphene Furnace is a CVD system capable of make single and bilayer graphene on Copper foil substrates. Graphene is a 2D material with many research opportunities.
Instructor: Tony Whipple, 1-612-626-1868, whipp003@umn.edu
SOP

Headway (badger spinner-headway)

Photo resist dispensing system.
SOP

HDPCVD

The Apex SLR ICP is a high density plasma-enhanced chemical vapor deposition system with an inductively coupled plasma configuration.
Instructor: Mark Fisher, 1-612-626-7465, fishe024@umn.edu
SOP

Intlvac Ion Mill (badger ionmill)

Ion etching system.
Instructor: Lage von Dissen, 612-626-2028, lage@umn.edu
SOP | Rates

JEOL SEM (badger jeol-sem)

The JSM-6610LV is a scanning electron microscope (SEM) comprised of a tungsten electron column and an Oxford Instruments Inca X-Act EDS. It can image and analyze a wide range of conducting and non-conducting samples, as well as provide compositional information using the EDS.
Instructor: Kevin Roberts, 1-612-624-7092, rober074@umn.edu
SOP

Karl Suss Contact Mask Aligner (badger ma6)

Used for optical lithography (350nm - 450nm wavelength range).
Instructor: Paul Kimani, 1-612-625-5968, kima0004@umn.edu
SOP | Wafer Dicing: A Beginners Guide | Photoresists

Karl Suss Contact Mask Aligner PAN (badger MA6-P)

Used for optical lithography (350nm - 450nm wavelength range).
Instructor: Paul Kimani, 1-612-625-5968, kima0004@umn.edu
SOP

Karl Suss Contact Mask Aligner (badger maba6)

Used for optical lithography (350nm - 450nm wavelength range).
Instructor: Paul Kimani, 1-612-625-5968, kima0004@umn.edu
SOP | Wafer Dicing: A Beginners Guide | Photoresists

KLA-Tencor P-7 (badger surface-prof-p7)

Surface profile measurement system located in PAN bay 3.
Instructor: Mark Fisher, 1-612-626-7465, fishe024@umn.edu
SOP | P-7 Training

KLA-Tencor P-16 (badger surface-prof-p16)

Surface profile measurement system.
Instructor: Mark Fisher, 1-612-626-7465, fishe024@umn.edu
SOP | P-16 Training

LPCVD (badger tube31-lsn, tube32-poly, tube33-nitride, tube34-lto)

Low pressure chemical vapor deposition system. Tube 31 is a Low Stress Nitride and regular Nitride process tube that is able to do 6" (150 mm) or 4" wafers. Tube 32 is the Poly deposition tube, which is for both N or P type doped Poly or undoped Poly. Tube 33 is a Low Stress Nitride and regular Nitride process tube. Tube 34 is a Low Temperature Oxide tube for both undoped and N and P doped films: LTO, PSG, BPSG.
Instructor: Tony Whipple, 1-612-626-1868, whipp003@umn.edu
SOP

Mask Maker (badger heidelberg-laserwriter)

This system can be used for either mask making or direct write on substrate (minimum size 1"x1"). Minimum feature size is 1.5 µm for line or space for the 5mm write head and 1.0µm line or space with 2mm write head.
Instructor: Mark Fisher, 1-612-626-7465, fishe024@umn.edu
SOP | Mask Making Design Rules | Mask Design Submission Form

Mini-Brute Furnace (badger mini-brute)

A horizontal tube atmospheric furnace system for oxidation, annealing, and alloying that is manually controlled by the user.
Instructor: Terry Brough, 1-612-626-1871, broug001@umn.edu
SOP

Nanospec-1 (badger nanospec-1)

Dielctric film thickness measuring system model 200.
SOP | Nanospec Training

Nanospec-2 (badger nanospec-2)

Dielctric film thickness measuring system model 200.
SOP | Nanospec Training

Nanonex NX-B200 Nanoimprinter (badger nanoimprinter)

Another method of transfering a pattern to a wafer with good resolution. This nanoimprinter is designed for thermal and UV-curable nanoimprint lithography (NIL).
Instructor: Mark Fisher, 1-612-626-7465, fishe024@umn.edu
SOP

Oriel (badger oriel)

Photo resist exposing system.
Instructor: Paul Kimani, 1-612-625-5968, kima0004@umn.edu
SOP

Ovens and Hot Plates

Photo resist baking system.
Instructor: Paul Kimani, 1-612-625-5968, kima0004@umn.edu
Pre-bake oven (badger oven-1)
Soft-bake oven (badger oven-2)
Hard-bake oven (badger oven-3)
Blue M exhausted bake oven (badger oven-4)
Hotplate (badger hotplate-prebake, hotplate-softbake, hotplate-hardbake)

Oxford (badger Oxford-etch)

Reactive ion etching system with Fl and Cl gases, ICP, and load lock.
Instructor: Tony Whipple, 1-612-626-1868, whipp003@umn.edu
SOP | Oxford etch chart

PEALD

The Fiji 200 Gen 2 plasma-assisted atomic layer deposition (PE-ALD) system is from UltraTech. It has a loadlock chamber to allow the deposition chamber to remain under vacuum reducing contamination effects of oxygen and water vapor in the films. Wafers up to 200mm in size. Aluminum oxide, aluminum nitride, titanium oxide, titanium nitride, hafnium oxide, and hafnium nitride are the current films.
Instructor: Tony Whipple, 1-612-626-1868, whipp003@umn.edu
SOP

PECVD (badger pecvd)

Plasma-enhanced chemical vapor deposition system.
Instructor: Robert Amundson, 1-612-626-9556, ramundso@umn.edu
SOP

Precision Spin Coater (badger spinner-cee1)

Used to coat most positive and some negative photoresist that are compatible with acetone solvent on any size substrate.
Instructor Paul Kimani, 1-612-625-5968, kima0004@umn.edu
SOP

Precision Spin Coater (badger spinner-cee2)

Used to coat SU8, LOR and SOG resists on any size substrate.
Instructor Paul Kimani, 1-612-625-5968, kima0004@umn.edu
SOP

Precision Spin Coater (badger spinner-cee3)

Used to coat most positive and some negative photoresist that are compatible with acetone solvent on 4" wafers only.
Instructor Paul Kimani, 1-612-625-5968, kima0004@umn.edu
SOP

RTA-1 (badger rta-1)

Rapid thermal annealing system.
Instructor: Terry Brough, 1-612-626-1871, broug001@umn.edu
SOP | Temperature Guide

Rudolph Ellipsometer (badger ellipsometer-r)

Laser based measuring system.
SOP | Ellipsometer Training

SB6 (badger sb6)

Wafer bonding system.
Instructor: Tony Whipple, 1-612-626-1868, whipp003@umn.edu
SOP | Process Notes | Wafer Dicing: A Beginners Guide

Spray/Puddle Developer (badger developer-cee4)

Used for spray/puddle develop of photoresist with developer solution and for rinse with deionized water on all substrates.
Instructor: Paul Kimani, 1-612-625-5968, kima0004@umn.edu
SOP

Stress Test-1 (badger stresstest-1)

Wafer stress or warpage system.
Instructor: Kevin Roberts, 1-612-624-7092, rober074@umn.edu
SOP | Stress Calculation Spreadsheet | Heat Cycle Spreadsheet | Heat RM Temp Spreadsheet

STS Etcher (badger stsetch)

Reactive ion etching system with Fl gases.
Instructor: Tony Whipple, 1-612-626-1868, whipp003@umn.edu
SOP | Rates | Notes | Parameters | Recipe SOP | STS Training

Temescal E-beam (badger ebevap-temescal)

E-beam deposition system.
Instructor: Terry Brough, 1-612-626-1871, broug001@umn.edu
SOP

Thermal Evaporator (badger thermevap)

Metal evaporation system.
Instructor: Kevin Roberts, 1-612-624-7092, rober074@umn.edu
SOP

Tylan Furnace Bank (badger tube13-ht-oxide, tube14-gate-oxide, tube15-gen-oxide, tube16-alloy)

Atmosphere oxidation system.
Instructor: Tony Whipple, 1-612-626-1868, whipp003@umn.edu
SOP | Tube 13 SPC Chart | Tube 14 SPC Chart | Tube 15 SPC Chart

UVO Cleaner (badger uv-ozone-cleaner)

Instructor: Lage von Dissen, 612-626-2028, lage@umn.edu
SOP

Varian E-beam (badger ebevap-varian)

E-beam deposition system.
Instructor: Kevin Roberts, 1-612-624-7092, rober074@umn.edu
SOP

Vistec EBPG5000+ (badger ebpg)

100 KeV E-beam lithography system.
Instructor: Kevin Roberts, 1-612-624-7092, rober074@umn.edu
SOP | Cygwin Software | Wiki

Wafer Saw (badger saw)

Wafer cutting system.
Instructor: Kevin Roberts, 1-612-624-7092, rober074@umn.edu
SOP | Request Form | Wafer Dicing: A Beginners Guide

Wet Benches

Keller Hall Contact: Robert Amundson, 1-612-626-9556, ramundso@umn.edu
PAN Bay 2 Contact: Tony Whipple, 1-612-626-1868, whipp003@umn.edu
PAN BAY 3 Contact: Kevin Roberts, 1-612-624-7092, rober074@umn.edu
PAN BAY 4 Contact: Paul Kimani, 1-612-625-5968, kima0004@umn.edu
PAN BAY 5 Contact: Kevin Roberts, 1-612-624-7092, rober074@umn.edu
SOP

Xenon di-fluoride e1-series etching system (badger XeF2-etch)

Used to dry-etch Si and other compatible material, isotropically, without the aid of a plasma.
Instructor: Paul Kimani, 1-612-625-5968, kima0004@umn.edu
SOP

YES 310 (badger yes-310)

Image reversal processing system.
SOP


Nanomaterials Lab Tools

The contact for all Nanomaterials lab tools is Jim Marti, 1-612-626-0732, jmarti@umn.edu.

Laser Diffraction Particle Size Analyzer

For measuring size distributions of particles in the range 100 nm to 2500 microns.
SOP

Optical Particle Size and Shape Analyzer

Uses a high speed camera to image individual particles between 1 and 2000 microns in size. Can measure size distributions and provide quantitative measurements of particle shape.
SOP

Dynamic Light Scattering Particle Size Analyzer

For measuring size distributions of fine particles from 1 nm to 6 microns in size.
SOP | Calibration notes

Zeta Potential Analyzer

For measuring he zeta potential of particles in suspension.
SOP

Controlled Atmosphere Glovebox

Stainless steel enclosure that can be filled with a dry, inert atmosphere for working with materials sensitive to moisture and oxygen.
SOP | Pump-down Curve

Materials Microscope

High quality upright materials microscope with polarization, DIC, digital camera, and image processing software.

Nanoparticle Tracking Analyzer

The NanoSight is a nanoparticle characterization tool that tracks the motion of nanoparticles suspended in a liquid. This took calculates size distributions for particles in the size range 40 nm to about 1 µm.
SOP


Bio-Nano Lab Tools

The contact for all Bio-Nano lab tools is Jim Marti, 1-612-626-0732, jmarti@umn.edu.

Confocal/fluorescence Microscope

A high performance inverted microscope for life science use; allows both confocal and wide-field imaging at multiple wavelengths.

Inverted Microscope

An inverted microscope ideal for examining cell cultures and other biological material; has bright field and dark field illumination, polarization, a digital camera, and image processing software.

Cell Culture Incubators

Two incubators for cell culturing at temperatures above ambient with controlled CO2 content. One custom chilled incubator for culturing at low temperatures (down to 4C) with full CO2 and O2 control.

Biosafety Hoods

Three level 2 biosafety hoods, one with external exhaust for working with hazardous solvents.