E-Beam Resist Quick Reference

Resist	Thinner (chemical)	Thinner (trade name)	Developer (chemical)	Developer (trade name)	Developer Rinse	Stripper(s)
PMMA (C-series)	Chlorobenzene	Microchem C-Thinner	MIBK*, IPA, H2O (various ratios)	n/a	Isopropanol	NMP (1165), acetone
PMMA (A-series)	Anisole	Microchem A-Thinner	MIBK, IPA, H2O (various ratios)	n/a	Isopropanol	NMP, acetone
ZEP520A	Anisole	Zeon ZEP-A	Amyl Acetate, Xylenes	ZED-N50 (amyl acetate)	Isopropanol	NMP, acetone
PMGI/LOR	Cyclopentanone	Microchem T Thinner	TMAH-based developers	CD-26, MF-319, etc	DI H2O	NMP, NaOH?, TMAH
HSQ	MIBK	n/a	TMAH/NaOH based developers	CD-26, MF-319, MF-351, etc	DI H2O	HF, BOE
ma-N 2403	Anisole	Microchem A Thinner	TMAH/NaOH based developers	CD-26, MF-319, MF-351, etc	DI H2O	NMP, acetone
NEB-31	PGMEA	n/a	TMAH/NaOH based developers	MF-321 preferred	DI H2O	NMP
SU-8	Cyclopentanone	Microchem T Thinner	PGMEA	Microchem SU-8 Developer	Isopropanol	Acetone, NMP, Cyclopentanone

* Bottles of MIBK are usually labeled with its "proper" IUPAC name, which is 4-methyl-2-pentanone.

DISCLAIMER: This chart is intended as a quick reference only, not a substitute for actual process recipes! Bryan and the rest of the NFC take no responsibility for the completeness or accuracy of any of the information contained in this chart.