Last Published Publisher VanessaZuroski Date 16 Feb 2016 09:50 Dir /swadm/etc/wiki/umwiki/pub/publish/ URL https://wiki.umn.edu/pub/publish/ Web EBPG Content ...
PMMA Spin Curves Below are spin curves for various concentrations of PMMA, courtesy of the UW Nanofabrication Facility. These are for A series (anisole solvent) PMMA ...
EBPG Standard Operating Procedure General Notes This document is intended as a refresher for people who have already had full training on the system, NOT as ...
Changing and Realigning the Aperture The standard 300 #956;m aperture in the EBPG will serve your purposes for 99.999% of writing jobs. In certain situations, however ...
Alignment Mark Design FAQ By popular demand, this document is intended to be a quick guide to good practices for designing, fabricating, and using alignment marks ...
Charge Suppression Guide Large label written on an insulating substrate. Charging has caused the rectangles that make up the numbers to stitch together incorrectly ...
PMMA/PMGI Bilayer E Beam Liftoff Process Reliable, repeatable liftoff processing in a planetary type evaporation system like the ones in the NFC requires the ability ...
PMMA/ZEP Cold Development Developing your resist below room temperature is a reliable, relatively easy way to improve the resolution of processes based on PMMA and ...
Command Line Shortcuts Align Syntax align mark definition Description Automates the process of locating, verifying, and writing down the coordinates of ...
High Resolution Si Etch Process Using Oxide Hard Mask Developed by Kevin Roberts (rober074 #64;umn.edu) Obligatory Disclaimer Process outlines are just that; they ...
Resist Handling Best Practices Guide Storing and Handling Resist Resist should NEVER, under any circumstances, be pipetted directly from the stock (factory) bottle ...
EBPG Software Guide #RealVNC RealVNC Download Windows (32 bit) Windows (64 bit) Linux (32 bit) Linux (64 bit) MacOS Installation (Win/Mac) Run the downloaded file ...
Writing on Transparent Substrates One of the Vistec's major weaknesses is its problems with writing on transparent substrates, such as fused silica. The reason for ...
Spot Size Guide Getting good results in e beam lithography means finding the best combination of a lot of different exposure parameters. Two of the most important ...
Vistec EBPG5000 Troubleshooting General Troubleshooting This table lists solutions to some common, easily solved problems you may run into during a write. Problem ...
Quickstart Step 1: Create a CAD pattern in GDS, CIF, or DXF format Software: CleWin, LayoutEditor, L Edit, etc. This can be done on your own computer or while ...
CJob Quickstart This document is intended to be a quick primer/refresh on using the CJob GUI to create jobs for the Vistec. For some useful examples of basic jobs ...
Shot Noise Guide Shot noise is the statistical variation in the number of electrons coming down the e beam column at a given current. It has a generally Poissonian ...
Using Image Based Alignment Introduction and Caveats This document is intended to be a quick guide to using image based alignment mark location on the EBPG, as an ...
nop EBPG Web Preferences The following settings are web preferences of the EBPG web. These preferences overwrite the site level preferences in ., and can be ...
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